ISO 29301:2023 微束分析 分析电子显微镜 通过使用带周期性结构的标准物质校准图像放大率的方法

标准编号：ISO 29301:2023

中文名称：微束分析 分析电子显微镜 通过使用带周期性结构的标准物质校准图像放大率的方法

英文名称：Microbeam analysis — Analytical electron microscopy — Methods for calibrating image magnification by using reference materials with periodic structures

发布日期：2023-10

标准范围

本文件规定了适用于透射电子显微镜（TEM）中在宽放大范围内记录的图像的校准程序。用于校准的参考材料具有周期性结构，例如衍射光栅复制品、用于X射线分析的半导体或分析晶体的超晶格结构以及碳、金或硅的晶格图像。本文件适用于记录在照相胶片或成像板上或由内置在数码相机中的图像传感器检测到的TEM图像的放大。本文件还涉及比例尺的校准。本文件不适用于专用临界尺寸测量TEM（CD-TEM）和扫描透射电子显微镜（STEM）。

This document specifies a calibration procedure applicable to images recorded over a wide magnification range in a transmission electron microscope (TEM). The reference materials used for calibration possess a periodic structure, such as a diffraction grating replica, a super-lattice structure of semiconductor or an analysing crystal for X-ray analysis, and a crystal lattice image of carbon, gold or silicon.

This document is applicable to the magnification of the TEM image recorded on a photographic film, or an imaging plate, or detected by an image sensor built into a digital camera. This document also refers to the calibration of a scale bar.

This document does not apply to the dedicated critical dimension measurement TEM (CD-TEM) and the scanning transmission electron microscope (STEM).

标准预览图