ISO 29301:2017 微束分析 分析透射电子显微镜 使用具有周期性结构的标准材料的图像放大校准法

标准编号：ISO 29301:2017

中文名称：微束分析 分析透射电子显微镜 使用具有周期性结构的标准材料的图像放大校准法

英文名称：Microbeam analysis — Analytical electron microscopy — Methods for calibrating image magnification by using reference materials with periodic structures

发布日期：2017-12

标准范围

ISO 29301:2017规定了适用于透射电子显微镜（TEM）中宽放大范围内记录的图像的校准程序。用于校准的标准物质具有周期性结构，例如衍射光栅复制品、半导体的超晶格结构或用于X射线分析的分析晶体，以及碳、金或硅的晶格图像。本文件适用于记录在照相胶片或成像板上的TEM图像的放大，或由内置在数码相机中的图像传感器检测的TEM图像的放大。本文件还涉及比例尺的校准。本文件不适用于专用临界尺寸测量TEM（CD-TEM）和扫描透射电子显微镜（STEM）。

ISO 29301:2017 specifies a calibration procedure applicable to images recorded over a wide magnification range in a transmission electron microscope (TEM). The reference materials used for calibration possess a periodic structure, such as a diffraction grating replica, a super-lattice structure of semiconductor or an analysing crystal for X-ray analysis, and a crystal lattice image of carbon, gold or silicon. This document is applicable to the magnification of the TEM image recorded on a photographic film, or an imaging plate, or detected by an image sensor built into a digital camera. This document also refers to the calibration of a scale bar. This document does not apply to the dedicated critical dimension measurement TEM (CD-TEM) and the scanning transmission electron microscope (STEM).

标准预览图