ISO 16531:2020 表面化学分析 深度剖面 在AES和XPS中用于深度剖面的离子束排列和相关的电流或电流密度测量方法

标准编号：ISO 16531:2020

中文名称：表面化学分析 深度剖面 在AES和XPS中用于深度剖面的离子束排列和相关的电流或电流密度测量方法

英文名称：Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

发布日期：2020-10

标准范围

本文件规定了离子束对准的方法，以确保在俄歇电子能谱（AES）和X射线光电子能谱（XPS）中使用惰性气体离子时，溅射深度剖面的良好深度分辨率和表面的最佳清洁。这些方法有两种:一种是用法拉第杯测量离子电流；另一个涉及成像方法。法拉第杯法还规定了离子束中电流密度和电流分布的测量。这些方法适用于带有光斑直径小于或等于1 mm光束的离子枪。这些方法不包括深度分辨率优化。

This document specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size less than or equal to 1 mm in diameter. The methods do not include depth resolution optimization.

标准预览图