ISO/ASTM 51818:2009 能量在80keV-300keV之间辐射加工的电子束设备的剂量测定规范

标准编号：ISO/ASTM 51818:2009

中文名称：能量在80keV-300keV之间辐射加工的电子束设备的剂量测定规范

英文名称：Practice for dosimetry in an electron beam facility for radiation processing at energies between 80 and 300 keV

发布日期：2009-06

标准范围

ISO 51818:20090适用于测定低能（300 keV或以下）单间隙电子束辐射处理设施性能的剂量学程序。还讨论了与设施特性、工艺鉴定和常规加工相关的其他实践和程序。ISO 51538:2009中涵盖的电子能量范围为80千电子伏至300千电子伏。这种电子束可以由单间隙独立热灯丝或等离子体源加速器产生。

ISO 51818:20090 applies to dosimetric procedures to determine the performance of low-energy (300 keV or less) single-gap electron-beam radiation processing facilities.Other practices and procedures related to facility characterization, process qualification and routine processing are also discussed.The electron-energy range covered in ISO 51538:2009 is from 80 keV to 300 keV. Such electron beams can be generated by single-gap self-contained thermal filament or plasma-source accelerators.

标准预览图